Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

Elam, Jeffrey W.; Groner, Markus D.; George, Steven M.

doi:10.1063/1.1490410

Cited by 545 publications

(637 citation statements)

References 26 publications

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“…The ALD chamber is a viscous flow reactor with the ALD source handling similar to that previously described by Elam et al 29 However, our ALD chamber differs significantly from those previous reported in its dimensions, sample mounting, It is quickly brought between atmospheric pressure and high vacuum by a turbomolecular pump. The ALD chamber (c) is isolated from the other chambers by two gate valves to ensure a proper flow profile of the ALD sources, and it is heated by heat rope wrapped around its exterior (not shown).…”

Section: B Ald Chambermentioning

confidence: 80%

Integrating atomic layer deposition and ultra-high vacuum physical vapor deposition for in situ fabrication of tunnel junctions

Elliot

Malek

et al. 2014

Review of Scientific Instruments

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Articles you may be interested inResistive switching characteristics of integrated polycrystalline hafnium oxide based one transistor and one resistor devices fabricated by atomic vapor deposition methods J. Vac. Sci. Technol. B 33, 052204 (2015) Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel junctions are an excellent example which require a leak-free, ultrathin dielectric tunnel barrier of typical thickness around 1 nm between two metal electrodes. A challenge in the development of ultrathin dielectric tunnel barriers using ALD is controlling the nucleation of dielectrics on metals with minimal formation of native oxides at the metal surface for high-quality interfaces between the tunnel barrier and metal electrodes. This poses a critical need for integrating ALD with ultra-high vacuum (UHV) physical vapor deposition. In order to address these challenges, a viscous-flow ALD chamber was designed and interfaced to an UHV magnetron sputtering chamber via a load lock. A sample transportation system was implemented for in situ sample transfer between the ALD, load lock, and sputtering chambers. Using this integrated ALD-UHV sputtering system, superconductor-insulator-superconductor (SIS) Nb-Al/Al 2 O 2 /Nb Josephson tunnel junctions were fabricated with tunnel barriers of thickness varied from sub-nm to ∼1 nm. The suitability of using an Al wetting layer for initiation of the ALD Al 2 O 3 tunnel barrier was investigated with ellipsometry, atomic force microscopy, and electrical transport measurements. With optimized processing conditions, leak-free SIS tunnel junctions were obtained, demonstrating the viability of this integrated ALD-UHV sputtering system for the fabrication of tunnel junctions and devices comprised of metal-dielectric-metal multilayers. © 2014 AIP Publishing LLC. [http://dx

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Section: B Ald Chambermentioning

confidence: 80%

Integrating atomic layer deposition and ultra-high vacuum physical vapor deposition for in situ fabrication of tunnel junctions

Elliot

Malek

et al. 2014

Review of Scientific Instruments

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“…Metal oxides were deposited on catalysts using a viscous flow ALD reactor 13 at 1 Torr pressure using ultrahigh purity nitrogen carrier gas at a mass flow rate of 20 sccm and a temperature of 125°C. The catalyst was first heated to 250 o C for one hour to remove physisorbed water and then weighed dry prior to loading into the ALD reactor.…”

Section: Ald Reactant Exposure Time Determinationmentioning

confidence: 99%

“…These results indicate that highly upgraded recycle lube oils can be produced using ALD-deposited active metal catalysts. The use of H 1 and C 13 NMR for the characterization of the treated lube oils has been shown to be effective. …”

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confidence: 99%

Accelerated deployment of nanostructured hydrotreating catalysts. Final CRADA Report.

Libera¹,

Snyder²,

Mane³

et al. 2012

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Nanomanufacturing offers an opportunity to create domestic jobs and facilitate economic growth. In response to this need, U.S. Department of Energy, Office of Energy Efficiency and Renewable Energy issued a Research Call to develop nanomanufacturing capabilities at the National Laboratories.High performance catalysts represent a unique opportunity to deploy nanomanufacturing technologies. Re-refining of used lube oil offers an opportunity to create manufacturing jobs and decrease dependence on imported petroleum. Improved catalysts are required to produce a better quality product, decrease environmental impact, extend catalyst life, and improve overall economics of lube oil re-refining.Argonne National Laboratory (Argonne) in cooperation with Universal Lubricants, Inc. (ULI) and Chemical Engineering Partners (CEP) have carried out a Cooperative Research and Development Agreement (CRADA) to prepare nanostructured hydrotreating catalysts using atomic layer deposition (ALD) to exhibit superior performance for the re-refining of used lube oil.We investigated the upgrading of recycled lube oil by hydrogenation using commercial, synthetically-modified commercial catalysts, and synthesized catalysts. A down-flow (trickle bed) catalytic unit was used for the hydrogenation experiments. In addition to carrying out elemental analyses of the various feed and product fractions, characterization was undertaken using H 1 and C 13 NMR.Initially commercial were evaluated. Second these commercial catalysts were promoted with precious metals using atomic layer deposition (ALD). Performance improvements were observed that declined with catalyst aging. An alternate approach was undertaken to deeply upgrade ULI product oils. Using a synthesized catalyst, much lower hydrogenation temperatures were required than commercial catalysts. Other performance improvements were also observed. The resulting lube oil fractions were of high purity even at low reaction severity. The products recovered from both the ALD and other processes were water-white (even those from the low temperature, low residence time (high space velocity), low conversion runs). These results indicate that highly upgraded recycle lube oils can be produced using ALD-deposited active metal catalysts. The use of H 1 and C 13 NMR for the characterization of the treated lube oils has been shown to be effective.

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“…For these reasons, the following sections will highlight efforts to control the nanoparticle size, and in particular to achieve ultra-small (<1nm) noble metal nanoparticles. In addition to depositing simple binary compounds such as Al 2 O 3 and elements such as Pd, ALD can also synthesize ternary and more complex compounds such as ZnAl 2 O 4 8 , as well as mixed metals such as Pt-Ir 9 . The ALD of mixed materials is accomplished by alternating between the binary reaction sequences of the individual components in the mixture, and the composition is controlled by adjusting the ratio of ALD cycles for the different components.…”

Section: Introductionmentioning

confidence: 99%

“…ALD reactors typically incorporate a chamber heated to ~100-400°C containing the substrate to be coated 4 . A constant stream of inert gas such as N 2 flows through the chamber at a pressure of ~0.1-10 Torr.…”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Noble Metals – New Developments in Nanostructured Catalysts

Lu¹,

Yu²,

Elam³

2012

Noble Metals

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Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

Cited by 545 publications

References 26 publications

Integrating atomic layer deposition and ultra-high vacuum physical vapor deposition for in situ fabrication of tunnel junctions

Integrating atomic layer deposition and ultra-high vacuum physical vapor deposition for in situ fabrication of tunnel junctions

Accelerated deployment of nanostructured hydrotreating catalysts. Final CRADA Report.

Atomic Layer Deposition of Noble Metals – New Developments in Nanostructured Catalysts

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