Visualisation of the wave-front deformations caused by a phase object by the method of successive double lateral shear interferometry

Simultaneous two-step phase-shifting lateral shearing interferometry for aspherical surface based on an orthogonal shear displacer

“…However, along with the rapid development of computer processing technology, the accuracy and stability of the wavefront measurement methods are proposed higher requirements. Lateral shearing interferometry (LSI) technology has become an effective tool in wavefront measurement due to its unique advantage that it does not require an ideal reference wavefront [2][3][4][5][6][7][8]. In recent years, researchers have presented many types of LSI wavefront measurement methods and have also applied different technologies to LSI design [1,3,4,6,[8][9][10].…”

“…Currently, wavefront measurement plays an increasingly important role in the optical measurement field, such as beam evaluation of laser, distortion measurement of the optical surface, aberration measurement of lenses, phases imaging of optical, etc [1][2][3][4][5][6]. However, along with the rapid development of computer processing technology, the accuracy and stability of the wavefront measurement methods are proposed higher requirements.…”

“…Lateral shearing interferometry (LSI) technology has become an effective tool in wavefront measurement due to its unique advantage that it does not require an ideal reference wavefront [2][3][4][5][6][7][8]. In recent years, researchers have presented many types of LSI wavefront measurement methods and have also applied different technologies to LSI design [1,3,4,6,[8][9][10]. Among them, polarization phase-shifting technology is one of the most effective methods for improving accuracy in LSI, especially in terms of the spatial phase-shifting simultaneous acquisition, it shows the advantages of simplicity, reliability, and small errors [7,11,12].…”