2009
DOI: 10.1063/1.3091291
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Void generation during the annealing process of very narrow copper wires

Abstract: We carried out experiments on stress-induced void formation in ultrathin Cu wires while varying heat-treatment temperature, wire dimensions, and overlayer thickness. We also did molecular dynamics simulations of void formation in a buried wire of nanometer scale and compared these results with experimental results to clarify details of the void formation mechanism. The experimental and simulation results showed good accordance in explaining the effects of wire width, overlayer thickness, and cooling rate on vo… Show more

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Cited by 4 publications
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“…They have been related to the growth (Fig 7 a and b) and coalescence of voids (Fig. 7 c and d), and cavities nucleated at grain boundaries which have been connected to the surface and assisted surface crack growth due to the reduction of the surface area resulting in the formation of a large number of microvoids that produce a dimpled crack surface [35,[40][41][42]. For the low heating rate, void coalescence could take place and the dimples appear larger, while for the fast heating rate very small dimples are observed at the fracture surface.…”
Section: Fracture Surface Analysismentioning
confidence: 99%
“…They have been related to the growth (Fig 7 a and b) and coalescence of voids (Fig. 7 c and d), and cavities nucleated at grain boundaries which have been connected to the surface and assisted surface crack growth due to the reduction of the surface area resulting in the formation of a large number of microvoids that produce a dimpled crack surface [35,[40][41][42]. For the low heating rate, void coalescence could take place and the dimples appear larger, while for the fast heating rate very small dimples are observed at the fracture surface.…”
Section: Fracture Surface Analysismentioning
confidence: 99%