VOIDLESS GRAINBOUNDARY GROWTH PROCESS OF Co-Cr THIN FILMS

Naoe, M.; Kadokura, S.

doi:10.3379/jmsjmag.18.s1_331

Cited by 2 publications

(2 citation statements)

References 8 publications

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“…However, the saturation for the ring-type head writing is influenced by the relation between the vertical head field gradient (dHy/dx) and H c i rather than by the relation between the head field intensity and H c i [6]. Nm for Co78Cr22 with large A h , which is proportional to Tm over 300 nm, is strongly affected by the increase in the grain size that accompanies the medium thickness increase [7]. For C072C1-28 with small A&o, the influence of the increase in the grain size is negligible, and Nm also saturates with Eo at a Tm of 300 nm.…”

Section: Improving the Recording Propertiesmentioning

confidence: 95%

Characteristics of high-density recording using a single-layer perpendicular medium and a merged MR head

et al. 1996

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The combination of a merged MR head and a SI and PI, separated by a read gap (G). The write portion single-layer perpendicular medium is a promising of the head was composed of an 18-turn coil and two NiFe technology for high-density recording. This paper layers, P1 and P2, separated by a write gap (Gw). The describes a system that provides high-linear-density dimensions of SI, G, PI, Gw, and p2 were 1.5, 0.3, 3.0, recording (over 150 kFCI) without requiring a contact 0.6, and 4.3 pm, respectively. The track widths of the MR and the large crystalline orientation of a Cr-rich C O~Z C T~~ The media used in this measurement were fabricated on recording method* Both .the large magnetic anisotropy Sensor and the write head were 2.5 and 3 pm, respectively. medium The large Output Out the promise Of higher linear density* glass disks by using a facing-targets sputtering machine. shows the possibility Of This fabrication method yielded a 300-nm-thick Co78Cr22 increasing the track density. The baseline shift for narrow track widths is an issue that must be solved by .future hard disk drive products. (at.%) film, with an H c i of 1600 Oe, an Ms of 380 the glass substrate; a 300-nm-thick Co72Cr28 film, with an H c l of 570 Oe, an Ms of 150 emu/ cm3, an Hk of 5.0 kOe, and a A050 of 4.4', also directly on the glass substrate: and Ms Of 214 emu/ cm39 an Hk-of 6.0 koe, and a A050 Of 4.007 on a 25-nm-thick Ti underlayer sputtered over the glass substrate. The values of Hk were estimated from in-plane magnetization curves [5 I. The overcoat thickness was 22Oe and an Mrt Of OS' lo" emu/cm2 was wed for comparison. The head's flying height in this experiment was 40 nm, with a linear equalization before this system can be used to realize emu/cm', an Hk of 5.5 k'Oe, and a A850 of 9.0°, directly on

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Section: Improving the Recording Propertiesmentioning

confidence: 95%

Characteristics of high-density recording using a single-layer perpendicular medium and a merged MR head

et al. 1996

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“…10,11 Growth of hexagonal-close-packed ͑hcp͒ crystalline Co films with a c-axis perpendicular to the substrate is the main subject in perpendicular magnetic recording because magnetization along the c axis of hcp Co crystal is the easy direction. 12,13 It should be noted that Co also forms a face-centered-cubic ͑fcc͒ crystal which is stable at higher temperatures above ϳ470°C. 12,13 It should be noted that Co also forms a face-centered-cubic ͑fcc͒ crystal which is stable at higher temperatures above ϳ470°C.…”

Section: Introductionmentioning

confidence: 99%

Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition

Okimura

Oyanagi

2003

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inLow-temperature oriented growth of vanadium dioxide films on CoCrTa metal template on Si and vertical metal-insulator transition J. Vac. Sci. Technol. A 30, 051502 (2012); 10.1116/1.4733995In situ measurement of surface stress evolution during sputter deposition of Co Cr X ∕ Cr ( X = Pt , Ta ) thin film and its magnetic properties J. Appl. Phys. 97, 10N116 (2005); 10.1063/1.1854253 Dynamic control of substrate bias for highly c -axis textured thin ferromagnetic CoCrTa film in inductively coupled plasma-assisted sputteringThe performance of inductively coupled plasma ͑ICP͒-assisted sputtering with an internal coil was revealed for deposition of ferromagnetic Co-based alloy films. Three types of internal coil, a directly grounded bare coil, a capacitively coupled bare coil and an insulated coil, were investigated with regard to the crystalline structure of films and plasma characteristics. Highly c-axis textured hexagonal-close-packed ͑hcp͒ film growth was achieved in the bare coil system at a medium operating Ar pressure of 1.3 Pa. Pole figure measurements showed that the film grown on a low-temperature Si substrate contained small face-centered-cubic phase in the c-axis textured hcp crystal. Plasma diagnostics suggested that high plasma space potential beyond 80 V caused highly textured growth through the effect of ion bombardment with proper energies for crystallization. The superior capability of ICP-assisted sputtering with a capacitively coupled bare coil was revealed for textured growth in the thin layer on a substrate surface. A high deposition rate was achieved as a result of high electron density of the order of 10 11 cm Ϫ3 in ICP-assisted sputtering with an insulated coil. However, the insulated coil system could not achieve textured growth.

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VOIDLESS GRAINBOUNDARY GROWTH PROCESS OF Co-Cr THIN FILMS

Cited by 2 publications

References 8 publications

Characteristics of high-density recording using a single-layer perpendicular medium and a merged MR head

Characteristics of high-density recording using a single-layer perpendicular medium and a merged MR head

Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition

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