Wafer redeposition impact on etch rate uniformity in IPVD system

Robison, R.L.; Brčka, Jozef

doi:10.1109/plasma.2006.1706947

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. 2006

DOI: 10.1109/plasma.2006.1706947

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Wafer redeposition impact on etch rate uniformity in IPVD system

R.L. Robison¹,

Jozef Brčka²

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Wafer redeposition impact on etch rate uniformity in IPVD system

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References 9 publications

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