2021
DOI: 10.1038/s41378-021-00257-y
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Wafer-scale transfer route for top–down III-nitride nanowire LED arrays based on the femtosecond laser lift-off technique

Abstract: The integration of gallium nitride (GaN) nanowire light-emitting diodes (nanoLEDs) on flexible substrates offers opportunities for applications beyond rigid solid-state lighting (e.g., for wearable optoelectronics and bendable inorganic displays). Here, we report on a fast physical transfer route based on femtosecond laser lift-off (fs-LLO) to realize wafer-scale top–down GaN nanoLED arrays on unconventional platforms. Combined with photolithography and hybrid etching processes, we successfully transferred GaN… Show more

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Cited by 38 publications
(33 citation statements)
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“…Towards that goal, a number of engineering challenges remain to be overcome, including the monolithic integration of multi‐color LEDs on a silicon substrate, the high‐yield transfer of μLEDs onto a flexible substrate, and a defect‐free yet flexible polymer encapsulation. Techniques for the monolithic integration of multi‐color LEDs [ 57 , 58 , 59 ] and those for the wafer‐level transfer of μLED from a rigid substrate to a flexible substrate [ 60 , 61 , 62 ] have been recently demonstrated by several research groups. We anticipate that these techniques will come to maturity in the near future and be incorporated for the fabrication of next‐generation hectoSTAR μLED optoelectrode.…”
Section: Discussionmentioning
confidence: 99%
“…Towards that goal, a number of engineering challenges remain to be overcome, including the monolithic integration of multi‐color LEDs on a silicon substrate, the high‐yield transfer of μLEDs onto a flexible substrate, and a defect‐free yet flexible polymer encapsulation. Techniques for the monolithic integration of multi‐color LEDs [ 57 , 58 , 59 ] and those for the wafer‐level transfer of μLED from a rigid substrate to a flexible substrate [ 60 , 61 , 62 ] have been recently demonstrated by several research groups. We anticipate that these techniques will come to maturity in the near future and be incorporated for the fabrication of next‐generation hectoSTAR μLED optoelectrode.…”
Section: Discussionmentioning
confidence: 99%
“…XRD has been used normally to measure the crystallinity of the synthesized materials, especially inorganic materials. [76][77][78] For electrospun nanobers, XRD was employed to verify their macromolecule orientation and elucidate the inuence of the electrospinner needle length on the crystalline structure of polyvinyl alcohol (PVA) nanobrous membranes. 72 Crystallinity is a good index for the degree of structural order, in which polymer molecule orientation affects the polymer crystallization (i.e., the higher the crystallization, the less the chain entanglement).…”
Section: Analytical Methods Papermentioning
confidence: 99%
“…Among the nanoscale lithography techniques (e.g., nanoimprint lithography, colloidal nanosphere lithography, and electron beam lithography), photolithography is considered the most established method [21][22][23][24]. It enables the formation of a large variety of patterns with relatively short processing time, high accuracy of structural transfer, and suitability for wafer-scale production [25]. The deposited pattern will serve as a mask in the subsequent etching step, in which the exposed Si is removed, and the pattern is transferred onto the Si wafer, resulting in the formation of vertical nanostructures on the Si substrate.…”
Section: Introductionmentioning
confidence: 99%