Wear process of single crystal diamond affected by sliding velocity and contact pressure in mechanical polishing

Yang, Ning; Zong, Wenjun; Li, Zengqiang; Sun, Tao

doi:10.1016/j.diamond.2015.06.004

Cited by 31 publications

(4 citation statements)

References 26 publications

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“…MP is the most widely used diamond polishing technique due to its simple equipment and low cost [87,88]. The cost of CMP is higher than that of MP, and it is widely used for precision polishing of diamond substrates [81].…”

Section: Characteristics and Limitations Of Conventional Polishing Te...mentioning

confidence: 99%

Energy beam-based direct and assisted polishing techniques for diamond: A review

Li,

Jiang,

Jiang

et al. 2023

Int. J. Extrem. Manuf.

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Diamond is a highly valuable material with diverse industrial applications, particularly in the fields of semiconductor, optics, and high-power electronics. However, its high hardness and chemical stability make it difficult to realize high-efficiency and ultra-low damage machining of diamond. To address these challenges, several polishing methods have been developed for both single crystal diamond (SCD) and polycrystalline diamond (PCD), including mechanical, chemical, laser, and ion beam processing methods. In this review, the characteristics and application scope of various polishing technologies for SCD and PCD are highlighted. Specifically, various energy beam-based direct and assisted polishing technologies, such as laser polishing, ion beam polishing, plasma-assisted polishing, and laser-assisted polishing, are summarized. The current research progress, material removal mechanism, and influencing factors of each polishing technology are analyzed. Although some of these methods can achieve high material removal rates or reduce surface roughness, no single method can meet all the requirements. Finally, the future development prospects and application directions of different polishing technologies are presented.

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Section: Characteristics and Limitations Of Conventional Polishing Te...mentioning

confidence: 99%

Energy beam-based direct and assisted polishing techniques for diamond: A review

Li,

Jiang,

Jiang

et al. 2023

Int. J. Extrem. Manuf.

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“…On the other hand, micromasking has been exploited to produce high aspect ratio features on diamond. [74][75][76][77] The second challenge arising from the use of metal masks during diamond etching is mesa sidewall surface quality and angle control. As the etch proceeds, the mask sputters and redeposits onto the sidewall creating a protective layer.…”

Section: Patterning Of Diamond With Reactive Ion Etchingmentioning

confidence: 99%

Polishing, preparation and patterning of diamond for device applications

Hicks

Pakpour‐Tabrizi

Jackman

2019

Diamond and Related Materials

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Central to future electronic device developments in diamond is the provision of smooth, low defect density substrate materials. This review examines plasma treatments of diamond to enable smoothing of rough surfaces, the removal of damage created by various non-plasma polishing processes previously applied and for patterning into device structures. The favoured reported plasma treatments for surface smoothing are detailed. The characterisation, effectiveness and other fabrication considerations of each plasma process are discussed. Despite significant recent progress the processing technology associated with plasma-etching diamond remains immature when compared to those used for conventional semiconductor materials.

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“…The seed substrate must be smooth enough for producing defect free SCD surface [119]. However there are polishing techniques which can produce atomically flat silicon substrates but producing atomically flat diamond [120] seed substrate needs further research. Growth hillocks ( Figure 7I) are formed due to preferential spiral growth at the site of screw dislocation in seed substrate, which are invariably present (10 4 -10 5 cm −2 ).…”

Section: Growth Theory Of Scdsmentioning

confidence: 99%

Microwave Plasma CVD Grown Single Crystal Diamonds - A Review

Mallik

2016

J. Coat. Sci. Technol.

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Diamond offers a range of unique properties, including wide band of optical transmission, highest thermal conductivity, stiffness, wear resistance and superior electronic properties. Such high-end properties are not found in any other material, so theoretically it can be used in many technological applications. But the shortcoming has been the synthesis of the diamond material in the laboratory for any meaningful use. Although microwave plasma chemical vapour deposited (MPCVD) has been in practice since 1980s for the diamond growth but it is in the past 7-8 years that its potential has been realised by the industry due to capability of MPCVD to deposit diamond, pure and fast, for commercial uses. There are many CVD techniques for growing diamond but among them MPCVD can only make single crystal diamond (SCD) effectively. SCD grown by MPCVD is also superior to other forms of diamond produced in the laboratory. For example, SCD is necessary for the best electronic properties-often outperforming the polycrystalline diamond (PCD), the high pressure high temperature (HPHT) diamond and the natural diamond. In many applications the short lateral dimensions of the lab-grown diamond available is a substantial limitation. Polycrystalline CVD diamond layers grown by hot filament CVD solved this problem of large area growth, but the presence of grain boundaries are not appropriate for many uses. On the other hand, there is still limitation in the area over which SCDs are grown by MPCVD, only upto 10-15 mm lateral sizes could have been achieved so far, while there are recipes which rapidly grow several mm thick bulk SCDs. This lateral size limitation of SCDs is primarily because of the small seed substrate dimension. Although natural and HPHT diamonds may not be suitable for the intended application, still they are routinely used as substrates on which SCD is deposited. But the problem lies in the availability of large area natural SCD seeds which are extremely rare and expensive. Moreover, large diamond substrate plates suitable for CVD diamond growth have not been demonstrated by HPHT because of the associated high economic risk in their fabrication and use. Other than lateral dimension, purity of SCD is also very important for technological use. Natural diamond is often strained and defective, and this causes twins and other problems in the CVD overgrowth or fracture during synthesis. In addition, dislocations which are prevalent in the natural diamond substrate are replicated in the CVD layer, also degrading its electronic properties. HPHT synthetic diamond is also limited in size, and generally is of poorer quality in the larger stones, with inclusions being a major problem. There will be much research interest in the next 10 years for the MPCVD growth of SCD. Purer and bigger SCDs will be tried to grow with faster and reproducible MPCVD recipes. Here the MPCVD growth of SCD is being reviewed keeping in mind its huge technological significance in the next decades or so. Discoveries of the commercial productions of silico...

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Wear process of single crystal diamond affected by sliding velocity and contact pressure in mechanical polishing

Cited by 31 publications

References 26 publications

Energy beam-based direct and assisted polishing techniques for diamond: A review

Energy beam-based direct and assisted polishing techniques for diamond: A review

Polishing, preparation and patterning of diamond for device applications

Microwave Plasma CVD Grown Single Crystal Diamonds - A Review

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