Wear-Resistance of Carbide-Containing Chrome Coatings Obtained From Gas Phase

Microstructure and Mechanical Properties of Annealed WC/C PECVD Coatings Deposited Using Hexacarbonyl of W with Different Gases

“…Gesheva et al also deposited polycrystalline W films [18], using hydrogen reduction of WCl at 750 • C, in Ar atmosphere. The deposition of coatings by the decomposition of W and Mo carbonyls, using the CVD technique, has been published in References [18,19], and the same process by the decomposition of Cr carbonyl in Reference [20]. Gesheva et al [18] obtained thicknesses of the WC coatings ranging from 0.12 to 0.6 µm and MoC coatings from 0.12 to 0.3 µm.…”

“…The hardness of the obtained MoC coating was situated in an interval from 11 to 18 GPa, while the thickness was presented by using the cross-sectional scanning electron microscopy (SEM) view of the pictures, from 143 to 173 µm. A CrC coating was deposited by Erokhin et al [20], using the process of decomposition of Cr carbonyl. Hardness was equal to 17 GPa; meanwhile, the thickness of the coating was not stated.…”

Development of the chemical vapor deposition process for applying molybdenum coatings on the components in assembly and engine construction

“…However, the paper does not contain either the data on the specific method and conditions of coating application, or the references to the conduction of such works before. A whole range of papers of the group of authors [5,16,17] focuses on the development of equipment and technologies for applying chromium gas-phase coatings to restore and strengthen agricultural machinery parts. In this paper, chromium carbonyl is used as a precursor for obtaining chromium coatings.…”

The Effect of Annealing Temperatures on Selected Properties of WC/C Coatings, Deposited Using Hexacarbonyl Wolfram in an N2-SiH4 Atmosphere

“…This process can be used in an improved CVD method, which is also called the plasma-enhanced (plasma-activated (PA), or plasma-inducted (PI)) chemical vapor deposition (PE CVD, PA CVD, or PI CVD) method. During plasmochemical processes (e.g., based on Ar and N2) the gas mixture is ionized and kinetic energy is transmitted to the used precursors, for example, wolfram carbonyl [21][22][23][24][25][26][27][28][29][30][31], chromium carbonyl [23,26,28,30,[32][33][34][35], and molybdenum carbonyl [21,29,30,31,36], which sublime in the reactor at low temperatures.…”