1994
DOI: 10.1016/0925-9635(94)90272-0
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Wear testing of CVD diamond films

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Cited by 19 publications
(13 citation statements)
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“…AES depth profiles for C/SiN x multilayer structures reveal the fluctuation of C, Si, and N intensities when moving away from the surface, approaching/crossing the C/SiN x interfaces, and reaching the film/substrate boundary, corroborating well with the actual designs of these multilayer structures. The immediate drop in C intensity and the immediate increase in O intensity in the first 50 s of most of the depth profiles after 5-Mm THW tests indicate that most of the head overcoats had been completely worn off, except in samples C, E, and M. Sample M with just a ~7- to 8-nm-thick overcoat displayed the best wear resistance (about 62% overcoat is still present after 5 Mm of THW) out of all the overcoats used in the present work and even surpasses the wear resistance of previously reported thicker and sputter-deposited ~20- to 100-nm coatings of CrN x , CrO x , CN x , c-BN, yttrium-stabilized ZrO 2 , W-C:H, a-C:H, Al 2 O 3 , and TiN ( 13 16 ).…”
Section: Resultssupporting
confidence: 46%
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“…AES depth profiles for C/SiN x multilayer structures reveal the fluctuation of C, Si, and N intensities when moving away from the surface, approaching/crossing the C/SiN x interfaces, and reaching the film/substrate boundary, corroborating well with the actual designs of these multilayer structures. The immediate drop in C intensity and the immediate increase in O intensity in the first 50 s of most of the depth profiles after 5-Mm THW tests indicate that most of the head overcoats had been completely worn off, except in samples C, E, and M. Sample M with just a ~7- to 8-nm-thick overcoat displayed the best wear resistance (about 62% overcoat is still present after 5 Mm of THW) out of all the overcoats used in the present work and even surpasses the wear resistance of previously reported thicker and sputter-deposited ~20- to 100-nm coatings of CrN x , CrO x , CN x , c-BN, yttrium-stabilized ZrO 2 , W-C:H, a-C:H, Al 2 O 3 , and TiN ( 13 16 ).…”
Section: Resultssupporting
confidence: 46%
“…At the same time, material wear is also a critical concern because the rapid removal and degradation of material result in early failure of various systems/devices (1)(2)(3). Magnetic storage devices, such as read/write heads, recording media of tape drives (TDs) and hard disk drives, probes for atomic force microscopy (AFM), micro-and nano-electromechancial systems (MEMS and NEMS), and many engineering scale components are some examples of MMSDs that suffer immensely from the adverse effects of wear and friction (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15)(16)(17)(18)(19). In general, from environmental, human health, and economical viewpoints, even a small fraction of friction and wear reduction is vital for energy savings and increasing the operational lifetime of systems.…”
Section: Introductionmentioning
confidence: 99%
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“…6,14,15 The results generally show that the global intrinsic stress depends on the methane fraction, deposition temperature 6 and crystallographic orientation. 14 However, the understanding of residual stress formation in such films is incomplete and seems to be in a significant disagreement among various researchers as to the type and magnitude of the stress, even for similar deposition conditions.…”
Section: Introductionmentioning
confidence: 87%