2020
DOI: 10.1016/j.jallcom.2020.153972
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Wetting and interfacial behavior of Cu–Al/SiC systems: Influences of Si ion implantation and Al concentration

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Cited by 9 publications
(8 citation statements)
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“…In contrast, a higher Si ion dose can weaken this phenomenon, showing an increased contact angle. In these cases, the σ SV keeps invariant (before ion implantation), or is increased due to the presence of the lattice imperfection and point defects after ion implantation [13], while the σ LV is decreased with the Sn concentration increasing, according to Amore's results [24]. Theoretically speaking, the increased σ SV or/and decreased σ LV can reduce the wettability of Cu-Sn/(Si-)SiC systems based on Young's equation.…”
Section: Resultsmentioning
confidence: 96%
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“…In contrast, a higher Si ion dose can weaken this phenomenon, showing an increased contact angle. In these cases, the σ SV keeps invariant (before ion implantation), or is increased due to the presence of the lattice imperfection and point defects after ion implantation [13], while the σ LV is decreased with the Sn concentration increasing, according to Amore's results [24]. Theoretically speaking, the increased σ SV or/and decreased σ LV can reduce the wettability of Cu-Sn/(Si-)SiC systems based on Young's equation.…”
Section: Resultsmentioning
confidence: 96%
“…Recently, our group has proved that Mo, Ref. [11] Pd [12] and Si [13] ion implantation can increase the σ SV of 6H-SiC monocrystal substrate by producing lattice imperfections and point defects, and thus the ion implantation is regarded as one of the key factors affecting the wettability of Al, Ref. [13] Al-Cu and [13] Al-Si-(Cu, Mg or Zn) [6,12] on SiC monocrystal substrate.…”
Section: Introductionmentioning
confidence: 99%
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