processes such as ion implantation can be used, but this approach tends to create undesirable defects, whose removal then requires additional annealing steps. Recently, lots of research attention has been focused on 2D materials, [1,2] as they not only exhibit great variety in electronic characteristics ranging from insulators to metals, but also possess unique properties related to their reduced dimensionality. While 2D materials can be doped with the same methods as bulk systems, there are approaches that are unique to them. Due to the surface-only geometry, the doping in 2D materials can also be attained by: 1) physical/chemical adsorption; 2) ionicliquid-gating; and 3) direct atomic substitution. [3,4] The surface adsorption and ionic-liquid-gating are basically equivalent to the implementation of charge transfer between the environment and the 2D materials, which are both very effective due the high surface to volume ratio of the 2D materials. However, the difficulties in integration of the system limit the practical applications of these approaches. The direct atomic substitution in 2D materials can be done via, e.g., sulfurization/selenization. [5] Alternatively, vacancies can be produced by irradiation [6,7] or thermal evaporation during annealing, [8] followed by the deposition of doping species. Direct substitution can also be achieved via ion implantation, but it is technically difficult, as it requires very low ion energies (below 100 eV) or needs an additional coating of buffer layer and The ORCID identification number(s) for the author(s) of this article can be found under