Wideband multilayer mirrors with minimal layer thicknesses variation

Кожевников, И. В.; Yakshin, Andrey; Bijkerk, F.

doi:10.1364/oe.23.009276

Cited by 31 publications

(24 citation statements)

References 22 publications

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“…To obtain larger bandpass we used an aperiodic multilayer design2526 based on the algorithm published in ref. 27. This multilayer was deposited on a 25.4 mm diameter silicon substrate with a radius of curvature of 40 cm prepared by Pilz-Optics.…”

Section: Methodsmentioning

confidence: 99%

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Dell’Angela

Hieke

Malvestuto

et al. 2016

Sci Rep

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In the past few years, we have been witnessing an increased interest for studying materials properties under non-equilibrium conditions. Several well established spectroscopies for experiments in the energy domain have been successfully adapted to the time domain with sub-picosecond time resolution. Here we show the realization of high resolution resonant inelastic X-ray scattering (RIXS) with a stable ultrashort X-ray source such as an externally seeded free electron laser (FEL). We have designed and constructed a RIXS experimental endstation that allowed us to successfully measure the d-d excitations in KCoF3 single crystals at the cobalt M2,3-edge at FERMI FEL (Elettra-Sincrotrone Trieste, Italy). The FEL-RIXS spectra show an excellent agreement with the ones obtained from the same samples at the MERIXS endstation of the MERLIN beamline at the Advanced Light Source storage ring (Berkeley, USA). We established experimental protocols for performing time resolved RIXS experiments at a FEL source to avoid X ray-induced sample damage, while retaining comparable acquisition time to the synchrotron based measurements. Finally, we measured and modelled the influence of the FEL mixed electromagnetic modes, also present in externally seeded FELs, and the beam transport with ~120 meV experimental resolution achieved in the presented RIXS setup.

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Section: Methodsmentioning

confidence: 99%

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Dell’Angela

Hieke

Malvestuto

et al. 2016

Sci Rep

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“…The corresponding Mo layers would have to be thinner than 1.5 nm, which leads to technological problems in fabrication. Specifically, the deposition of Mo/Si multilayers involves a formation of molybdenum silicide interlayers of considerable thickness (0.6-0.8 nm) and unknown density [17,18], which would lead to uncontrolled optical material properties.…”

Section: Fidelity Parameters and Merit Functionmentioning

confidence: 99%

“…To investigate this question, we extend our previous merit function, MF in Eq. (3), to a total merit function, MF 1 , with an extra term [18,25] that enables optimization of aperiodic multilayers also towards smaller variation in the layer thickness:…”

Section: Multilayer Mirrors With Reduced Variation Of the Layer Thickmentioning

confidence: 99%

Reflective aperiodic multilayer filters for metrology at XUV sources

et al. 2020

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We present a general method for designing XUV aperiodic multilayer mirrors that can mimic a given target spectrum, specifically, the spectral transmission of an XUV optical system. The method is based on minimizing a merit function and using fidelity parameters that quantify the matching of the multilayer reflectivity spectrum with that of the target spectrum. To assess the feasibility of fabricating such a system, we show how to reduce the layer-to-layer thickness variations throughout the aperiodic layer stack. We demonstrate the design method using an example of an EUV optical system composed of 12 identical Mo/Si multilayer mirrors having a reflectivity peak at 13.5 nm. We found that the target spectrum can be mimicked with high fidelity either with a single reflection at an aperiodic multilayer mirror combined with standard absorbing filters or, if required, with two subsequent reflections at a mimic mirror. These examples demonstrate the applicability for metrology at XUV sources, including spectrally proper source imaging. Because our approach is of general applicability, the process can be used to mimic any other narrowband, single-peaked target spectrum in the XUV region.

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“…This issue was solved by Kozhevnikov et al using a new merit function including a factor to constrain the layer thickness variation. 39 Broad angle multilayers providing an almost constant reflectivity of 50% in the 0 -16 interval of incidence angle (k ¼ 13.5 nm) were designed with a layer thickness variation not exceeding 0.39 nm. 39 …”

Section: B Broadband Multilayer Mirrormentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Wideband multilayer mirrors with minimal layer thicknesses variation

Cited by 31 publications

References 22 publications

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Extreme ultraviolet resonant inelastic X-ray scattering (RIXS) at a seeded free-electron laser

Reflective aperiodic multilayer filters for metrology at XUV sources

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

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