2006
DOI: 10.1016/j.apsusc.2006.03.042
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Work function of sol–gel indium tin oxide (ITO) films on glass

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Cited by 34 publications
(9 citation statements)
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“…The deposition of TCOs on the substrate can be made using several physical or chemical methods, such as spincoating [8], magnetron sputtering [9], chemical vapor deposition (CVD) [10], vacuum evaporation [11], reaction evaporation [12] and the sol-gel process [6,[13][14][15][16][17][18][19]. The sol-gel method has several advantages, including simplicity, low cost, easily controlled doping levels and feasible preparation of large area films [6].…”
Section: Introductionmentioning
confidence: 99%
“…The deposition of TCOs on the substrate can be made using several physical or chemical methods, such as spincoating [8], magnetron sputtering [9], chemical vapor deposition (CVD) [10], vacuum evaporation [11], reaction evaporation [12] and the sol-gel process [6,[13][14][15][16][17][18][19]. The sol-gel method has several advantages, including simplicity, low cost, easily controlled doping levels and feasible preparation of large area films [6].…”
Section: Introductionmentioning
confidence: 99%
“…4, the characteristic peaks at 2u = 21.5, 30.5, 35.4, 51.0, and 60.78 correspond to the primary diffractions of (2 1 1), (2 2 2), (4 0 0), (4 4 0), and (6 2 2) crystalline planes in cubic bixbyite structure of the In 2 O 3 . No phases corresponding to tin or to other tin compounds were detected indicating that the tin atoms were doped substitutionally in the In 2 O 3 lattice [24,25]. For the composites, besides the crystalline peaks of ITO, the diffractograms display partially crystalline areas at about 218 which could be assigned to the presence of hard segment in the polyurethane such as benzene rings.…”
Section: Xrd Analysismentioning
confidence: 91%
“…Several deposition techniques are reported to obtain ITO thin‐films including spray pyrolysis, [ 8 ] sol–gel methods, [ 9 ] pulsed laser deposition, [ 10 ] e‐beam evaporation, [ 11 ] physical vapor deposition, [ 12 ] chemical vapor deposition, [ 13 ] and atomic layer deposition (ALD). [ 14 ] Among these methods, ALD is a thin‐film deposition technique that is based on alternating, self‐limiting chemical reactions between gaseous precursors and a solid surface to produce high quality, uniform and conformal coatings even at low growth temperatures.…”
Section: Introductionmentioning
confidence: 99%