The correlation between sub-band gap absorption and the chemical states and
electronic and atomic structures of S-hyperdoped Si have been extensively studied,
using synchrotron-based x-ray photoelectron spectroscopy (XPS), x-ray absorption
near-edge spectroscopy (XANES), extended x-ray absorption fine structure (EXAFS),
valence-band photoemission spectroscopy (VB-PES) and first-principles calculation. S
2p XPS spectra reveal that the S-hyperdoped Si with the greatest
(~87%) sub-band gap absorption contains the highest concentration of
S2− (monosulfide) species. Annealing S-hyperdoped Si
reduces the sub-band gap absorptance and the concentration of
S2− species, but significantly increases the
concentration of larger S clusters [polysulfides
(Sn2−,
n > 2)]. The Si K-edge XANES spectra show that
S hyperdoping in Si increases (decreased) the occupied (unoccupied) electronic
density of states at/above the conduction-band-minimum. VB-PES spectra evidently
reveal that the S-dopants not only form an impurity band deep within the band gap,
giving rise to the sub-band gap absorption, but also cause the insulator-to-metal
transition in S-hyperdoped Si samples. Based on the experimental results and the
calculations by density functional theory, the chemical state of the S species and
the formation of the S-dopant states in the band gap of Si are critical in
determining the sub-band gap absorptance of hyperdoped Si samples.