We report an experimental and modeling study of ZnS y Se 1Ày /GaAs (001) structures, all of which comprised a uniform top layer of ZnS 0.014 Se 0.986 grown on a compositionally graded buffer layer or directly on the GaAs substrate. High-resolution x-ray diffraction was used to estimate dislocation densities on type A slip systems, with misfit dislocation (MD) line segments oriented along the ½1 " 10 direction, and type B slip systems, with MD line segments oriented along a [110] direction. A control sample having no graded buffer exhibits equal dislocation densities on the two types of slip systems (D A % D B % 1.5 9 10 8 cm À2 ), but a forward-graded (FG) structure (grading coefficient of 27 cm À1 ) exhibits 20% more dislocations on the type B slip systems (D A % 1.6 9 10 8 cm À2 and D B % 1.9 9 10 8 cm À2 ) and a steep forwardgraded structure (grading coefficient of 54 cm À1 ) exhibits 50% more type B dislocations (D A % 2 9 10 8 cm À2 and D B % 3 9 10 8 cm À2 ). The insertion of an overshoot interface reduced the dislocation densities in the uniform top layer by promoting annihilation and coalescence reactions, but type B dislocations were removed more effectively. Based on equilibrium calculations the overshoot graded layer in the steep graded overshoot structure is expected to exhibit large compressive and tensile strains, with a reversal in the sign of the strain near its middle, which may promote annihilation and coalescence reactions between threading dislocations.