The GaN-based heterostructures and related HEMTs (High Electron Mobility Transistors) were investigated by 1MeV neutrons at fluences up to 10 15 cm −2 , yielding an increase of the densities of screw dislocations and edge dislocations for GaN-based heterostructures. It gave the result that neutron irradiation-induced structural defects into GaN-based materials, and the irradiation-induced dislocations would propagate to the material surface causing surface morphology deterioration. However, the GaN-based material strain was robust to neutrons, and the more initial dislocations, the easier to generate irradiation defects and thus, more strongly affecting the electrical property degradations of materials and devices. Meanwhile, the reduction of the two-dimensional electron gas (2DEG) concentration (n s) caused by irradiation-induced defects led to the reducing the drain current. Moreover, the significant degradation of the reverse gate leakage current at fluences ranging from 10 14 to 10 15 cm −2 could be attributed to the irradiation-induced deep defects. The neutron induced damage was more difficult to anneal recovery than other particles, due to the neutron irradiation-induced deep levels and defect complexes such as defect clusters.