The research of the surface and the near-surface region of Cz-Si wafers irradiated with fast oxygen and neon ions of energy 4 MeV/u and dose 10 14 particles/cm2 is presented. In our study several methods based on the Bragg case of X-ray diffraction using Ag K« 1 , as well as reflection high-energy electron diffraction and Nomarsky optical microscopy were used. It was • shown that implantation with fast neon ions causes larger disturbances of silicon crystal structure than irradiation with oxygen ions.