1996
DOI: 10.12693/aphyspola.89.301
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X-ray Diffraction Investigations of Structure of Silicon Single Crystals after Irradiation by Heavy Ions

Abstract: Structure distortions appearing near the surfaces of crystals irradiated by high energy ions (H, Kr, U) accelerated till energy of several MeV using respectively the accelerator U-120 (Kiev, Ukraine), the heavy ions accelerators (Caen, France and Darmstadt, Germany) were investigated by means of various X-ray diffraction methods (topography and diffractometry). Nonhomogeneous distribution of lattice distortions near the surfaces of irradiated crystals were discovered using these methods in all of the samples. … Show more

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Cited by 3 publications
(3 citation statements)
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“…2, performed basing on the interpretations given in papers [8][9][10] indicates for the larger variation of the shape of the curve after irradiation with neon ions. The diffraction effects (flash-up of intensity) from the amorphous layers are pointed out by the arrows on the curves for the both implanted samples.…”
Section: Resultsmentioning
confidence: 98%
See 1 more Smart Citation
“…2, performed basing on the interpretations given in papers [8][9][10] indicates for the larger variation of the shape of the curve after irradiation with neon ions. The diffraction effects (flash-up of intensity) from the amorphous layers are pointed out by the arrows on the curves for the both implanted samples.…”
Section: Resultsmentioning
confidence: 98%
“…The curves of spatial distribution of X-ray intensity were registered at the fixed Bragg position of the sample with narrow (≈ 50 pm) slits situated near the moving detector. This method permits to separate from the recorded intensity the contribution of diffuse scattered intensity IDs due to defects localized at various depths as well as elastic strains [8][9][10]. Hówever, the inhomogeneous distribution of defects along the normal to the surface does not allow to determine some average structural characteristics of the layers situated at the absorption depth t o = p -1 , where p is the photoelectric coefficient of absorption.…”
Section: Methodsmentioning
confidence: 99%
“…It was recently shown [4,5] that using more sensitive reflections of shorter wavelength and high indices results in improved detection of small inclusions and other microdefects. This may be easily realized with the use of synchrotron radiation providing a free choice of radiation wavelength and reflections and a better spatial resolution.…”
Section: Introductionmentioning
confidence: 99%