X-Ray Photoelectron Diffraction Study on the Surface and Interface Structure of VO2/TiO2(110) Model Catalyst

Abstract

We have studied the atomic structure of the surface and interface of VO2/TiO2(110) model catalyst by X-ray photoelectron diffraction (XPED). In this study, vanadium was deposited on the TiO2(110) surface in the oxygen atmosphere. We characterized the VO2 ultra-thin film grown on the TiO2(110) surface by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), and XPED. As a result, VO2 ultra-thin film grown epitaxially on TiO2(110) was determined by using the multiple scattering cluster model with spherical wave (MSC-SW). Finally, we carried out the quantitative analysis by using the reliability factor R (R-factor) method and clarified the surface and interface structures of VO2/TiO2(110).