This paper investigates the effect of photocatalysis on the sensitivity of oxygen sensors constructed with SnO 2 /TiO 2 thin films. An R.F. magnetron sputtering system is employed to fabricate SnO 2 /TiO 2 double-layer films. The thin films are deposited with SnO 2 /TiO 2 thickness ratios of 250/50, 200/100, 150/150, 100/200, and 50/250 nm, respectively. During deposition, the Ar:O 2 flow rate is fixed at 4:1. To stabilize the material properties, the films are annealed for four hours at a temperature of either 550 or 650 C. The increase in sensitivity of the SnO 2 / TiO 2 thin films when irradiated by UV light with a wavelength of 365 nm is investigated. The results indicate that the annealed samples have higher oxygen sensitivities than the as-deposited samples. The sensitivity of the non-annealed samples increases from 0.70 to 1.15 under UV irradiation, while the sensitivity of the annealed samples increases from 7.17 to 10.60. Therefore, it is clear that UV irradiation causes the sensitivity of the SnO 2 /TiO 2 thin films to increase significantly. Finally, it is found that the oxygen sensitivity of the SnO 2 /TiO 2 thin films increases as the SnO 2 /TiO 2 ratio is reduced.