“…Hence, precursor materials like zinc acetate [5,6,9,12,17] and zinc nitrate [9,32,34] have been widely utilized to obtain ZnO films by decomposing the precursors. In addition to this a number of novel processing chemistry based on combustion synthesis [13,38], metal alkoxide precursor [10], single source tailored organo-complex precursors [39,40] and photosensitive precursors [11,12,41,42] have also been demonstrated to exhibit excellent performance in metal oxide devices. Towards this end, we explore the usability of non-aqueous precursor zinc neodecanoate, referred henceforth as Zn(NDN), as a novel precursor material for ZnO based electronics with further prospects of fabrication steps being compatible with nanoscale directwriting through electron-beam exposure [43,44].…”