1992
DOI: 10.1021/cm00023a015
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Zinc oxysulfide thin films grown by atomic layer deposition

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Cited by 67 publications
(53 citation statements)
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“…The direct band gap of Zn(O,S) layer is approximately 3.6 eV ( Fig. 4b) being slightly higher than the Eg value presented by (Sanders and Kitai, 1992) for ALD deposited Zn(O,S) films with sulphur to zinc ratio of 0.9.…”
Section: Properties Of Zn(os) Layersmentioning
confidence: 55%
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“…The direct band gap of Zn(O,S) layer is approximately 3.6 eV ( Fig. 4b) being slightly higher than the Eg value presented by (Sanders and Kitai, 1992) for ALD deposited Zn(O,S) films with sulphur to zinc ratio of 0.9.…”
Section: Properties Of Zn(os) Layersmentioning
confidence: 55%
“…So far, Zn(O,S) layers have been prepared by methods that are either slow, not in-line suitable or vacuum techniques, such as chemical bath deposition (CBD) (Buffière et al, 2011;Kushiya, 2004;Sáez-Araoz et al, 2008;Witte et al, 2013), atomic layer deposition (ALD) l t erjorkm n et l l t er-j rkm n et l., 2006; Sanders and Kitai, 1992;Zimmermann et al, 2006), sputtering (Grimm et al, 2011(Grimm et al, , 2010Klenk et al, 2013;Kobayashi et al, 2013;Nakamura et al, 2013). The best efficiencies for solar cells with sputtered or ALD deposited Zn(O,S) buffer layer are similar, 18.3% and 18.5% respectively (Klenk et al, 2013;Zimmermann et al, 2006).…”
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confidence: 99%
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“…By varying the cycle ratio of ZnO to ZnS during the ALD process, the elemental composition of Zn(O,S) can be adjusted. 31 Fig. 2(a)) depending on the cleaving direction with respect to these platelet grains.…”
mentioning
confidence: 99%
“…5,6,8,9 Various growth methods have been previously reported for Zn(O,S), such as sputtering, 8,10,11 chemical bath deposition (CBD), 12 pulse laser deposition (PLD), 13,14 and ALD. 5,6,15,16 ALD has the advantage of easily controlling the stoichiometry of multicomponent films by simply tailoring the pulse ratio of the precursors.…”
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confidence: 99%