Abstract:In this paper, we describe a novel fabrication technique of ZnO-based film bulk acoustic resonator (FBAR) devices using a new type of multilayered Bragg reflector with very thin chromium (Cr) layers additionally formed between SiO 2 and W layers. Each Cr layer is considered to enhance the adhesion between the SiO 2 and W layers. The fabricated FBAR devices are shown to operate at the frequency range of 2.7 -3.0 GHz, along with good return loss as well as high Q-factors. Furthermore, the effects of bottom elect… Show more
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