No abstract

To date, silicon backplane spatial light modulators have been characterized by poor-quality mirrors. Hillock formation during metal sintering has been identified as the source of this problem. Here hillock elimination is achieved by constraining the metal with a low-temperature plasma-enhanced chemicalvapor deposition silicon dioxide coating. A double-layer metallization procedure increases the silicon area available for circuitry and improves the mirror fill factor. Second-layer metal mirrors require a flat, intermediate dielectric substrate. Chemical-mechanical polishing is demonstrated to provide the flatness necessary to achieve high optical quality.

The performance of liquid-crystal-over-silicon spatial light modulators has advanced rapidly in recent years. Most progress has centered around new device designs with increased bandwidth. In this paper we report on a number of techniques to improve the optical quality; these have applications in both current and future devices.

No abstract

No abstract