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In the present paper, the authors report on the electrochromic properties of electron beam evaporated tungsten oxide (WO 3 ) thin films at different electrolytes. The authors observe the better electrochromic performance for the as deposited room temperature prepared films than the higher substrate temperature prepared films and annealed films. In addition, the less reversible coloration was observed for the heavier ion (K z ) intercalation/deintercalation than the lighter one (Li z ), which may be due to the effect of microstructure of the films, and ion mobility. The possible role of electrochromic performance in the mechanism of film crystallinity has been discussed.

Undoped and nitrogen (N) doped nickel oxide (NiO) thin films were deposited onto glass substrates using a simplified spray pyrolysis technique with two different doping levels of N (10 and 20 at-%). The effects of N doping level on the structural, electrical and optical properties were studied and reported. From the structural studies, it is found that the preferential orientation changed from ( 111) to ( 200) for higher concentrations. The optical studies revealed that the average optical transmittance and optical band gap decreased (from 3?5 to 3?4 eV) due to N doping. The electrical resistivity decreased by one order (from 3?84Ez03 Vcm to 5?38Ez02 Vcm) in the case of higher doping of N. The defects generated by N doping were analysed using the photoluminescence studies. The size of the grains decreased due to N doping as seen from SEM studies.