We demonstrate a new semiconductor quantum system based on GaSb quantum dots (QDs) embedded in single-crystalline AlGaSb matrix by filling droplet-etched nanoholes. The dropletmediated growth mechanism allows formation of low QD densities required for non-classical singe-QD light sources. The photoluminescence (PL) experiments reveal that the GaSb QDs have an indirect-direct bandgap cross-over at telecom wavelengths. This is due to the alignment of the Γ and L valleys in the conduction band as a result of quantum confinement controlled by dimensions of the nanostructure. We show that in the direct bandgap regime close to 1.5 µm wavelength, the GaSb QDs have a type I band alignment and exhibit excitonic emission with narrow spectral lines and very low inhomogeneous broadening of PL emission owing to the high material quality and dimensional uniformity. These properties are extremely promising in terms of applications in infrared quantum optics and quantum photonic integration.

We demonstrate nanohole formation in AlGaSb by Ga droplet etching within a temperature range from 270°C to 500°C, allowing a wide range of tunability of the nanohole density. By leveraging the low vapor pressure of Sb, we can obtain high degree of control over droplet formation and nanohole etching steps and reveal the physics of adatom diffusion in these processes. Furthermore, by combining the experimental results and a geometric diffusion-based model, we can determine the temperature and Sb-flux-dependencies of the critical monolayer coverage of Sb atoms required for driving the droplet etching process to completion. These findings provide new insight into the droplet formation and etching process present in the droplet-mediated synthesis of semiconductor nanostructures and represent a significant step towards development of telecom-emitting quantum dots in the GaSb system.

Several passivation techniques are developed and compared in terms of their ability to preserve the optical properties of close-to-surface InAs/GaAs quantum dots (QDs). In particular, the influence of N-passivation by hydrazine chemical treatment, N-passivation by hydrazine followed by atomic layer deposition (ALD) of AlO x and use of AlN x deposited by plasma-enhanced ALD are reported. The effectiveness of the passivation is benchmarked by measuring the emission linewidths and decay rates of photo-carriers for the near-surface QDs. All three passivation mechanisms resulted in reducing the oxidation of Ga and As atoms at the GaAs surface and consequently in enhancing the room-temperature photoluminescence (PL) intensity. However, long-term stability of the passivation effect is exhibited only by the hydrazine + AlO x process and more significantly by the AlN x method. Moreover, in contrast to the results obtained from hydrazine-based methods, the AlN x passivation strongly reduces the spectral diffusion of the QD exciton lines caused by charge fluctuations at the GaAs surface. The AlN x passivation is found to reduce the surface recombination velocity by three orders of magnitude (corresponding to an increase of room-temperature PL signal by ∼1030 times). The reduction of surface recombination velocity is demonstrated on surface-sensitive GaAs (100) and the passivating effect is stable for more than one year. This effective method of passivation, coupled with its stability in time, is extremely promising for practical device applications such as quantum light sources based on InAs/GaAs QDs positioned in small-volume photonic cavities and hence in the proximity of GaAs-air interface.

We demonstrate a Purcell-enhanced single photon source based on individual InAs/GaAs quantum dots embedded in a hybrid plasmonic-GaAs nanopillar cavity.