Optical metasurfaces with subwavelength thickness hold considerable promise for future advances in fundamental optics and novel optical applications due to their unprecedented ability to control the phase, amplitude, and polarization of transmitted, reflected, and diffracted light. Introducing active functionalities to optical metasurfaces is an essential step to the development of next-generation flat optical components and devices. During the last few years, many attempts have been made to develop tunable optical metasurfaces with dynamic control of optical properties (e.g., amplitude, phase, polarization, spatial/spectral/temporal responses) and early-stage device functions (e.g., beam steering, tunable focusing, tunable color filters/absorber, dynamic hologram, etc) based on a variety of novel active materials and tunable mechanisms. These recently-developed active metasurfaces show significant promise for practical applications, but significant challenges still remain. In this review, a comprehensive overview of recently-reported tunable metasurfaces is provided which focuses on the ten major tunable metasurface mechanisms. For each type of mechanism, the performance metrics on the reported tunable metasurface are outlined, and the capabilities/limitations of each mechanism and its potential for various photonic applications are compared and summarized. This review concludes with discussion of several prospective applications, emerging technologies, and research directions based on the use of tunable optical metasurfaces. We anticipate significant new advances when the tunable mechanisms are further developed in the coming years.

Enhanced and controlled light absorption, as well as field confinement in optically thin materials, are pivotal for energy‐efficient optoelectronics and nonlinear optical devices. Highly doped transparent conducting oxide (TCO) thin films can support the so‐called epsilon near zero (ENZ) modes in a frequency region of near‐zero permittivity, which can lead to the perfect light absorption and ultrastrong electric field intensity enhancement (FIE) within the films. To achieve full control over absorption and FIE, one must be able to tune the ENZ material properties as well as the film thickness. Here, engineered absorption and FIE are experimentally demonstrated in aluminum‐doped zinc oxide (AZO) thin films via control of their ENZ wavelengths, optical losses, and film thicknesses, tuned by adjusting the atomic layer deposition (ALD) parameters such as dopant ratio, deposition temperature, and the number of macrocycles. It is also demonstrated that under ENZ mode excitation, though the absorption and FIE are inherently related, the film thickness required for observing maximum absorption differs significantly from that for maximum FIE. This study on engineering ENZ material properties by optimizing the ALD process will be beneficial for the design and development of next‐generation tailorable photonic devices based on flat, zero‐index optics.

We present a numerically feasible method for rigorous modeling of crossed diffraction gratings made of isotropic materials with third-order nonlinearity. The approach is based on an iterative solution of the crossed-grating problem with linear but anisotropic materials. We also discuss how the symmetries of the effective linear permittivity tensor can be exploited to speed up the computation when one considers normal incidence of light. Several numerical experiments are performed to demonstrate the accuracy as well as the versatility of this numerical technique.

Using electrodynamical description of the average power absorbed by a conducting film, we present an expression for the electric-field intensity enhancement (FIE) due to epsilon-near-zero (ENZ) polariton modes. We show that FIE reaches a limit in ultrathin ENZ films inverse of second power of ENZ losses. This is illustrated in an exemplary series of aluminum-doped zinc oxide nanolayers grown by atomic layer deposition. Only in a case of unrealistic lossless ENZ films, FIE follows the inverse second power of film thickness predicted by S. Campione, et al. [Phys. Rev. B, vol. 91, no. 12, art. 121408, 2015]. We also predict that FIE could reach values of 100,000 in ultrathin polar semiconductor films. This work is important for establishing the limits of plasmonic field enhancement and the development of near zero refractive index photonics, nonlinear optics, thermal, and quantum optics in the ENZ regime.

Nanocomposites, i.e., materials comprising nano-sized entities embedded in a host matrix, can have tailored optical properties with applications in diverse fields such as photovoltaics, bio-sensing, and nonlinear optics. Effective medium approaches such as Maxwell-Garnett and Bruggemann theories, which are conventionally used for modeling the optical properties of nanocomposites, have limitations in terms of the shapes, volume fill fractions, sizes, and types of the nanoentities embedded in the host medium. We demonstrate that grating theory, in particular the Fourier Eigenmode Method, offers a viable alternative. The proposed technique based on grating theory presents nanocomposites as periodic structures composed of unit-cells containing a large and random collection of nanoentities. This approach allows us to include the effects of the finite wavelength of light and calculate the nanocomposite characteristics regardless of the morphology and volume fill fraction of the nano-inclusions. We demonstrate the performance of our approach by calculating the birefringence of porous silicon, linear absorption spectra of silver nanospheres arranged on a glass substrate, and nonlinear absorption spectra for a layer of silver nanorods embedded in a host polymer material having Kerr-type nonlinearity. The developed approach can also be applied to quasi-periodic structures with deterministic randomness or metasurfaces containing a large collection of elements with random arrangements inside their unit cells.