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Articles you may be interested inMagnetoresistance and Hall-effect measurements of Ni thin films J. Appl. Phys. 97, 083902 (2005); 10.1063/1.1866500Physical and micromagnetic structural characterizations of rfsputtered amorphous CoZrNb thin films Magnetooptic Kerr effect hysteresis loop measurements on rfsputtered iron oxide thin films SnO x films, made by reactive rfmagnetron sputtering onto unheated glass, were studied by electron microscopy, Hall-effect measurements, and Mossbauer spectrometry. Transmission electron microscopy showed that the films were polycrystalline with a grain size of ~ 15 nm.Hall-effect measurements gave a sharp resistivity minimum (down to 2.8 X 10 J.n cm) and electron concentration maximum (up to 1.2 X 10 20 cm -3) at a specific O 2 / Ar gas-flow ratio during sputtering. Mossbauer spectrometry indicated that the most conducting films only consisted of the Sn0 2 phase, and that a SnO phase appeared at low O 2 / Ar ratio where it lowered the conductivity.

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