Articles you may be interested inFabrication of high quality factor photonic crystal microcavities in In As P ∕ In P membranes combining reactive ion beam etching and reactive ion etchingSmooth sidewall in InP-based photonic crystal membrane etched by N 2 -based inductively coupled plasma Fabrication of two-dimensional InP-based photonic crystals by chlorine based chemically assisted ion beam etching J.The fabrication process of a InP-based two-dimensional photonic crystal membrane structure is developed. The process includes a well-calibrated electron-beam ͑e-beam͒ lithography and InGaAsP/InP etching using methane-hydrogen-argon reactive ion etching. The photonic crystal blocks with ten rows of a hexagonal array of holes with various lattice constants and filling factors are successfully fabricated and characterized by optical transmission measurement. The sensitivity of the band gap to the systematic fabrication error is determined.

An experimental study of light propagation near a small band gap for a lattice-of-holes InP photonic crystal waveguide is reported. Polarization-resolved measurements of power transmission, reflection and group delay clearly reveal the PC waveguide filtering properties. Group delay enhancement was observed close to the band-edges together with very large dispersion. The test devices were fabricated with a novel technique that allows incorporation of deeply-etched photonic crystals within an InP photonic integrated circuit.

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