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Cadmium oxide thin films was deposited by thermal oxidation method, on glass substrate with the thickness (300 ∓ 10)nm and deposition rate (1.25)nm/sec. The films doped with the (In) with the different ratios(l,2,3)%. The topographic and morphology structures of films are characterized by(XRD), (SEM) and (AFM) techniques. XRD investigation showed all films have polycrystalline structures with the preferred orientation (111) plane. The results of microscopic testing proved that presence the nanostructures and all the films were homogeneous and smooth, with a characteristic nano grain size, by scanning electron microscope (SEM), which show that fact formation of all nanostructures with different shapes and grain size. In addition, the results of atomic force microscope (AFM) show that presence nanostructures and there is effect of In-dopant on the root mean square (RMS) roughness of the films, where it increases while the grain size decreases with the increasing of In-dopant.

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