International audienceIn this paper, the transition from smooth layer to nanostructured one during plasma deposition of polyaniline is demonstrated. The deposition mechanism at low discharge power allows obtaining a smooth layer with well-defined chemical structure while high discharge power gives a structured layer but does not preserve the monomer structure. A method giving the possibility to overcome these problems by combination of high- and low-power deposition is described. Obtained layers are investigated by FT-IR spectrometry, profilometry, and atomic force microscopy
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