ZnO nanorod assemblies were grown by plasma-enhanced chemical vapor deposition on polycrystalline Al(2)O(3) at 200-300 degrees C, resulting in urchin-like 1-D ZnO NR arrays with a strong c-axis orientation. Their outstanding gas sensing responses and very low detection limits highlight the potential of the present systems in the production of high efficiency chemical sensors for a variety of applications
p-Type Co(3)O(4) nanostructured films are synthesized by a plasma-assisted process and tested in the photocatalytic production of H(2) from water/ethanol solutions under both near-UV and solar irradiation. It is demonstrated that the introduction of fluorine into p-type Co(3)O(4) results in a remarkable performance improvement with respect to the corresponding undoped oxide, highlighting F-doped Co(3)O(4) films as highly promising systems for hydrogen generation. Notably, the obtained yields were among the best ever reported for similar semiconductor-based photocatalytic processes.
Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems Hafnium͑IV͒ oxide thin films were synthesized by atomic layer deposition ͑ALD͒ on Si͑100͒ substrates, using an innovative guanidinate-stabilized hafnium amide precursor, ͓Hf͑NEtMe͒ 2 ͑EtMeNC͑N i Pr͒ 2 ͒ 2 ͔. In the present work, our attention is focused on a detailed XPS characterization of a representative HfO 2 coating grown at 350°C. Beside the wide scan spectrum, detailed spectra for the O 1s, Hf 4f, Hf 4d and C 1s regions and related data are presented and discussed. The obtained results point out to the formation of HfO 2 coatings characterized by the presence of -OH groups, whose main origin is attributed to the use of water as oxidizing agent during the preparation process.
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