An atmospheric plasma jet (APPJ, 27.17 MHz, Ar with 1% HMDSO) has been studied for the deposition of thin silicon-organic films. Jet geometries are attractive for local surface treatment or for conformal covering of 3D forms, e.g. inner walls of wells, trenches or cavities, because they are not confined by electrodes and their dimensions can be varied from several centimetres down to the sub-millimetre region. Deposition experiments have been performed on flat polymer and glass samples with a deposition rate of 0.25-23 nm s −1 . The knowledge of the static deposition profile of the plasma source (footprint) is essential to allow for a controlled deposition with the source moving relative to the substrate. By adjusting the plasma parameters (RF power and gas flow) to the geometry (i.e. electrode configuration, tube diameter, relative tube position, substrate distance) the footprint can be shaped from a ring form reflecting the tube dimension to a parabolic profile. Next to the conventional stochastic mode of operation we observe a characteristic locked mode-reported here for the first time for an RF-APPJ which can improve the film deposition process distinctively. The experimental results of the local film distribution agree well with an analytical model of the deposition kinetics. The film properties have been evaluated (profilometry, XPS, FT-IR spectroscopy and SEM) for different deposition conditions and substrate distance. The FT-IR spectra demonstrate dominating SiO absorption bands, thus providing an indication for the prevailing (inorganic) SiO x character of the films. HMDSO molecules disintegrate to a sufficient degree as proved by the absence of CH 2 absorption in the spectra. XPS measurements confirm the local dependence with a slightly increased organic character a few millimetres away from the maximum in the deposition profile. The substrate distance and the source direction both seem relevant and require consideration during coating of 3D objects.

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MAX phases are etched using an ionic liquid-water mixture to produce titanium carbide MXenes. The process avoids the use of any acid. Hydrolysis of the fluorine-containing ionic liquid leads to...

Novel non-thermal plasma (NTP) technology has the potential to address the bonding issues of Y-TZP and Ti surfaces. This study aims to chemically characterize and evaluate the surface energy (SE) of Y-TZP and Ti surfaces after NTP application. Y-TZP and Ti discs were treated with a hand-held NTP device followed by SE evaluation. Spectra of Y-TZP 3d and Ti 2p regions, survey scans, and quantification of the elements were performed via X-ray photoelectron Spectroscopy (XPS) prior and after NTP. Separate Y-TZP and Ti discs were NTP treated for contact angle readings using (10-methacryloyloxydecyl dihydrogenphosphate) MDP primer. Significant augmentation of SE values was observed in all NTP treated groups. XPS detected a large increase in the O element fraction on both Y-TZP and Ti surfaces. Reduction of contact angle reading was obtained when the MDP primer was placed on NTP treated Y-TZP. Ti surface showed high SE before and after NTP application on Ti surfaces. NTP decreased C and increased O on both surfaces independently of application protocol. Wettability of MDP primer on Y-TZP was significantly increased after NTP. The high polarity obtained on Y-TZP and Ti surfaces after NTP applications appear promising to enhance bonds.