Porous silicon was fabricated by using a Nd:YAG laser in a
laser-induced etching process. Scanning electron microscopy was used to
monitor changes in surface morphology produced during the etching process.
Porous silicon samples were subjected to spectroscopic investigations using an
argon-ion laser. The first-order Raman line asymmetry was found to decrease
with decrease of the incident argon-ion laser excitation photon energy, while
the peak position remained unchanged for a given etching time and power
density. The photoluminescence spectra exhibits a red shift in peak position
and a dramatic decrease in intensity as the incident photon energy was
decreased. Both Raman and photoluminescence data were explained using
appropriate quantum confinement models involving two-dimensional confinement
and Gaussian size distributions of nanocrystallites constituting porous
silicon samples. There is reasonable agreement between the results obtained
from Raman and photoluminescence spectroscopic investigations of the PS samples.
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