Extreme ultraviolet (EUV) lithography is currently considered as the leading technology for high-volume manufacturing below sub-20 nm feature sizes. In parallel, EUV interference lithography based on interference transmission gratings has emerged as a powerful tool for industrial and academic research. In this paper, we demonstrate nanopatterning with sub-10 nm resolution using this technique. Highly efficient and optimized molybdenum gratings result in resolved line/space patterns down to 8 nm half-pitch and show modulation down to 6 nm half-pitch. These results show the performance of optical nanopatterning in the sub-10 nm range and currently mark the record for photon-based lithography. Moreover, an efficient phase mask completely suppressing the zeroth-order diffraction and providing 50 nm line/space patterns over large areas is evaluated. Such efficient phase masks pave the way towards table-top EUV interference lithography systems.

We present an experimental and theoretical study of plasmonic modes in high aspect ratio nanostructures in the visible wavelength region and demonstrate their high performance for sensing applications. Ordered and well-defined plasmonic structures with various cross-sectional profiles and heights are obtained using a top-down fabrication process. We show that, compared to cylindrical nanorods, structures with split-ring resonator-like cross sections have great potential for powerful sensing due to a pronounced polarization dependence, strong field enhancement, structural tunability, and improved mechanical stability. The plasmonic structures under study exhibit high sensitivities, up to nearly 600 nm/RIU, and figures of merit above 20.

We report a novel process technology of hemispherical shaped microlenses, using isotropic wet etching of silicon in an acid solution to produce the microlenses molds. Governed by process parameters such as temperature and etchant concentration, the isotropic wet etching is controlled to minimize various defects that appear during the molding creation. From the molds, microlenses are fabricated in polymer by conventional replication techniques such as hot embossing and UV-molding. The characterization of molds and measurements of replicated microlenses demonstrate high smoothness of the surfaces, excellent repeatability of mold fabrication and good optical properties. Using the proposed method, a wide range of lens geometries and lens arrays can be achieved.

We present a simple and cost-effective method for the fabrication of antireflective surfaces by self-assembly of block copolymers and subsequent plasma etching. The block copolymers create randomly oriented periodic patterns, which are further transferred into fused silica substrates. The reflection on the patterned fused silica surface is reduced to well below 1% in the ultraviolet, visible, and near-infrared ranges by exploiting subwavelength nanostructures with periodicities down to 48 nm. We show that by choosing the appropriate block copolymers and pattern transfer parameters the optical properties of the antireflective surface can be easily tuned, and the spectral measurements verify a significant reduction of the reflectivity by a factor of 10. The experiments, confirmed with simulations based on rigorous diffraction theory, also show that the tapered shape of the nanostructures gives rise to a graded index surface, resulting in a broad-band antireflective behavior.

A surface consisting of periodically arranged nanopyramids producing wide-angle broad-band antireflection properties is presented. The reflectance of silicon dioxide is reduced below 0.45% over the visible spectral range (380-760 nm) for viewing angles from 0 degrees to 40 degrees . The surface is designed by using rigorous diffraction theory and fabricated first in silicon by exploiting its strong crystalline orientation and by using the wet etching process. The structure is transferred from silicon to transparent silicon dioxide by using nano-imprint lithography and proportional reactive ion etching.