Single-crystalline intrinsic and N-doped p-type ZnTe nanoribbons (NRs) were synthesized via the thermal evaporation method in argon-mixed hydrogen and nitrogen-mixed ammonia, respectively. Both intrinsic and doped ZnTe nanoribbons had zinc blende structure and uniform geometry. X-ray diffraction peaks of N-doped ZnTe nanoribbons had an obvious shift toward higher angle direction as compared with intrinsic ZnTe. X-ray photoelectron spectroscopy detection confirmed that the dopant content of nitrogen in ZnTe nanoribbons was close to 1%. Field-effect transistors based on both intrinsic and N-doped ZnTe nanoribbons were constructed. Electrical measurements demonstrated that N-doping led to a substantial enhancement in p-type conductivity of ZnTe nanoribbons with a high hole mobility of 1.2 cm−2 V−1 S−1 and a low resistivity of 0.14 Ω cm in contrast to the 6.2 × 10−3 cm−2 V−1 S−1 and 45.1 Ω cm for intrinsic nanoribbons. Moreover, the defect reaction mechanism was proposed to explain the p-type behaviors of both the intrinsic and the N-doped ZnTe nanoribbons.The ZnTe nanoribbons with enhanced p-type conductivity may have important potential applications in nanoelectronic and optoelectronic devices.

High-performance field-effect transistors (FETs) based on single phosphorus-doped n-type CdS nanoribbon with high-κ HfO2 dielectric and top-gate geometry were constructed. In contrast to the nano-FETs that were fabricated on SiO2/Si substrate with back-gate device configuration, the top-gate FETs exhibit a substantial improvement in performances, i.e., work voltage was reduced to a small value of within ±5 V, the subthreshold swing was reduced to 200 mV/dec and the Ion/Ioff ratio was increased by about six orders of magnitude. The top-gate CdS:P nano-FET shows high sensitivity upon light irradiation, revealing that the top-gate FETs are promising candidates for nanoelectronic and optoelectronic applications.

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