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Simultaneous absorption and scattering mappings are used to study the influence of local defects on the laser damage threshold of thin films. The same area is mapped for absorption and scatter before and after irradiation at the threshold fluence. The study is performed for an uncoated fused silica substrate and two single-layer films deposited on fused silica substrates at a wavelength of x = 1 .06 jim.Initial results seem to indicate that the irradiation can create and enhance absorption and scattering defects. This study is conducted as part ofthe Megajoule laser project.

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