High- and reproducible-performance photodetectors are critical to the development of many technologies, which mainly include one-dimensional (1D) nanostructure based and film based photodetectors. The former suffer from a huge performance variation because the performance is quite sensitive to the synthesis microenvironment of 1D nanostructure. Herein, we show that the graphene/semiconductor film hybrid photodetectors not only possess a high performance but also have a reproducible performance. As a demo, the as-produced graphene/ZnS film hybrid photodetector shows a high responsivity of 1.7 × 107 A/W and a fast response speed of 50 ms, and shows a highly reproducible performance, in terms of narrow distribution of photocurrent (38–65 μA) and response speed (40–60 ms) for 20 devices. Graphene/ZnSe film and graphene/CdSe film hybrid photodetectors fabricated by this method also show a high and reproducible performance. The general method is compatible with the conventional planar process, and would be easily standardized and thus pay a way for the photodetector applications.
Film-based photodetectors have shown superiority for the fabrication of photodetector arrays, which are desired for integrating photodetectors into sensing and imaging systems, such as image sensors. But they usually possess a low responsivity due to low carrier mobility of the film consisting of nanocrystals. Large-grain semiconductor films are expected to fabricate superior-responsivity photodetector arrays. However, the growth of large-grain semiconductor films, normally with a nonlayer structure, is still challenging. Herein, this study introduces a solid-state reaction method, in which the growth rate is supposed to be limited by diffusion and reaction rate, for interface-confined epitaxial growth of nonlayer structured NiSe films with grain size up to micrometer scale on Ni foil. Meanwhile, patterned growth of NiSe films allows the fabrication of NiSe film based photodetector arrays. More importantly, the fabricated photodetector based on as-grown high-quality NiSe films shows a responsivity of 150 A W in contrast to the value of 0.009 A W from the photodetector based on as-deposited NiSe film consisting of nanocrystals, indicating a huge responsivity-enhancement up to four orders of magnitude. It is ascribed to the enhanced charge carrier mobility in as-grown NiSe films by dramatically decreasing the amount of grain boundary leading to scattering of charge carrier.
We have achieved band-tunable photodetectors based on graphene/alloyed ZnxCd1–xS film hybrids with cut-off edge in spectra response gradually changed from 410 nm to 580 nm.
The similar response time for UV and visible light of the graphene/CdS photodetector is intentionally tuned by inserting ZnS films to produce the graphene/ZnS/CdS photodetector, which can be used as a characteristic parameter to distinguish the detected UV and visible light.
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