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The use of gate bias to control electronic phases in VO 2 , an archetypical correlated oxide, offers a powerful method to probe their underlying physics, as well as for the potential to develop novel electronic devices. Up to date, purely electrostatic gating in 3-terminal devices with correlated channel shows the limited electrostatic gating efficiency due to insufficiently induced carrier density and short electrostatic screening length. Here massive and reversible conductance modulation is shown in a VO 2 channel by applying gate bias V G at low voltage by a solid-state proton (H + ) conductor. By using porous silica to modulate H + concentration in VO 2 , gate-induced reversible insulator-tometal (I-to-M) phase transition at low voltage, and unprecedented two-step insulator-to-metal-to-insulator (I-to-M-to-I) phase transition at high voltage are shown. V G strongly and efficiently injects H + into the VO 2 channel without creating oxygen deficiencies; this H + -induced electronic phase transition occurs by giant modulation (≈7%) of out-of-plane lattice parameters as a result of H + -induced chemical expansion. The results clarify the role of H + on the electronic state of the correlated phases, and demonstrate the potentials for electronic devices that use ionic/electronic coupling.

Designing energy-efficient artificial synapses with adaptive and programmable electronic signals is essential to effectively mimic synaptic functions for brain-inspired computing systems. Here, we report all-solid-state three-terminal artificial synapses that exploit proton-doped metal–insulator transition in a correlated oxide NdNiO3 (NNO) channel by proton (H+) injection/extraction in response to gate voltage. Gate voltage reversibly controls the H+ concentration in the NNO channel with facile H+ transport from a H+-containing porous silica electrolyte. Gate-induced H+ intercalation in the NNO gives rise to nonvolatile multilevel analogue states due to H+-induced conductance modulation, accompanied by significant modulation of the out-of-plane lattice parameters. This correlated transistor operated by a proton pump shows synaptic characteristics such as long-term potentiation and depression, with nonvolatile and distinct multilevel conductance switching by a low voltage pulse (≥ 50 mV), with high energy efficiency (∼1 pJ) and tolerance to heat (≤150 °C). These results will guide the development of scalable, thermally-stable solid-state electronic synapses that operate at low voltage.

Atomic layer deposition was adopted to deposit VO thin films using vanadyl tri-isopropoxide {VO[O(CH)], VTIP} and water (HO) at 135 °C. The self-limiting and purge-time-dependent growth behaviors were studied by ex situ ellipsometry to determine the saturated growth conditions for atomic-layer-deposited VO. The as-deposited films were found to be amorphous. The structural, chemical, and optical properties of the crystalline thin films with controlled phase formation were investigated after postdeposition annealing at various atmospheres and temperatures. Reducing and oxidizing atmospheres enabled the formation of pure VO and VO phases, respectively. The possible band structures of the crystalline VO and VO thin films were established. Furthermore, an electrochemical response and a voltage-induced insulator-to-metal transition in the vertical metal-vanadium oxide-metal device structure were observed for VO and VO films, respectively.

The band width control through external stress has been demonstrated as a useful knob to modulate metal-insulator transition (MIT) in RNiO3 as a prototype correlated materials. In particular, lattice mismatch strain using different substrates have been widely utilized to investigate the effect of strain on transition temperature so far but the results were inconsistent in the previous literatures. Here, we demonstrate dynamic modulation of MIT based on electric field-controlled pure strain in high-quality NdNiO3 (NNO) thin films utilizing converse-piezoelectric effect of (001)-cut - (PMN-PT) single crystal substrates. Despite the difficulty in the NNO growth on rough PMN-PT substrates, the structural quality of NNO thin films has been significantly improved by inserting SrTiO3 (STO) buffer layers. Interestingly, the MIT temperature in NNO is downward shifted by ~3.3 K in response of 0.25% in-plane compressive strain, which indicates less effective TMI modulation of field-induced strain than substrate-induced strain. This study provides not only scientific insights on band-width control of correlated materials using pure strain but also potentials for energy-efficient electronic devices.