Small angle x-ray scattering ͑SAXS͒ measurements are used to quantify the wavelength and amplitude of the sidewall roughness in a lithographic line:space pattern due to vertical standing waves present during the photoresist exposure. Analytic equations are derived to model the x-ray scattering intensity and are used to determine the periodicity and amplitude of the standing wave roughness. The average periodicity, or pitch, and the linewidth were L = 422± 1 nm and w 0 = 148± 1 nm. The period and amplitude of the standing wave roughness were s = 65± 1 nm and A s = 3.0± 0.5 nm. These results demonstrate the potential of SAXS measurements to quantify nondestructively and quantitatively dimensional deviations from an ideal structure.

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