A two-step electrochemical anodization was used to form the anodic aluminum oxide (AAO) thin films with nanotube arrays of self-organized honeycomb structure. Al foil was anodized in 10% sulfuric acid (H2SO4) and 3% oxalic acid (H2C2O4) at 25°C at constant voltage of 40 V for 60 min for two times. Ethylene glycol (C2H6O2) was used as a solution and 0.3 M potassium iodide (KI) was used to improve the solution’s conductivity. Different electrolyte concentrations of Bi(NO3)3-5H2O, SbCl3, and TeCl4were added into KI-C2H6O2solution and the cyclic voltammetry experiment was used to find the reduced voltages of Bi3+, Sb3+, and Te4+ions. The potentiostatic deposition and pulse electrodeposition (PED) processes were used to deposit the (Bi,Sb)2−xTe3+x-based materials. Field-emission scanning electron microscope and energy dispersive spectrometers were used to analyze the compositions of the deposited (Bi,Sb)2−xTe3+x-based materials. After finding the optimal deposition parameter of the PED process the AAO nanotube arrays were used as the templates to deposit the (Bi,Sb)2−xTe3+x-based thermoelectric nanowires.
In this study, the cyclic voltammetry method was first used to find the reduced voltages and anodic peaks of Bi3+, Sb3+, and Te4+ ions as the judgments for the growth of the (Bi,Sb)2 - x Te3 + x-based materials. Ethylene glycol (C2H6O2) was used as a solvent, and 0.3 M potassium iodide (KI) was used to improve the conductivity of the solution. Two different electrolyte formulas were first used: (a) 0.01 M Bi(NO3)3-5H2O, 0.01 M SbCl3, and 0.01 M TeCl4 and (b) 0.015 M Bi(NO3)3-5H2O, 0.005 M SbCl3, and 0.0075 M TeCl4. The potentiostatic deposition process was first used to find the effect of reduced voltage on the variation of compositions of the (Bi,Sb)2 - xTe3 + x-based materials. After finding the better reduced voltage, 0.01 M Bi(NO3)3-5H2O, 0.01 M SbCl3, and 0.01 M TeCl4 were used as the electrolyte formula. The pulse deposition process was successfully used to control the composition of the (Bi,Sb)2 - xTe3 + x-based materials and grow the nanowires in anodic aluminum oxide (AAO) templates.
In this work, GZO thin films were prepared by sol-gel process and spin coating technique. The XRD results showed the preferential c-axis orientation of the crystallites and the presence of the wurite phase of ZnO and it were suggested that the presence of Ga might be changed the d-spacing of ZnO to formation the Ga-doped zinc oxide. The effects of Ga amount on the conductivity and transparency were studied. The electrical resistivity for the GZO film doped 2 at% of Ga could be lowered to be 7.510-3Ω-cm with the calcination temperature was 550°C and hydrogen treatment was conducted in the Ar/H2 (97/3) atmosphere at 500°C. In addition, the optical transmittances of GZO thin films were higher than 90% in visible wavelength region.
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