A new room-temperature imprinting method was developed using liquid-phase hydrogen silsesquioxane (HSQ) with a hard poly(dimethylsiloxane) (h-PDMS) mold. The simultaneous imprinting of arbitrary patterns including both submicron and greater than 100 µm patterns on a 4-in. wafer were replicated at room-temperature and a low pressure with high throughput, because the solvent in HSQ gradually evaporated through the pores of the h-PDMS mold. A bilayer structure was successfully fabricated using as HSQ pattern as an etching mask without removing the residual layer.

Organic spin-on-glass (O-SOG) has been newly proposed as a replication material used in room-temperature (RT)-nanoimprinting. O-SOG is very suitable for optical applications thanks to its good optical properties, including a high refractive index of 1.56 and a transparency that exceeds 98%. O-SOG microlens arrays were successfully replicated by using RT-nanoimprinting. UV pre-irradiation offered O-SOG-nanoimprinted patterns the property of maintaining their initial profiles after 300 °C annealing, while the patterns without any treatment completely disappeared after 300 °C annealing due to the polymer reflow.

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