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A periodically poled structure on type-III ultraviolet ͑UV͒-grade planar fused silica was realized by periodic UV erasure of second-order nonlinearity of the thermally poled fused silica plate. Poling and UV-erasure characteristics are given. The second-order nonlinearity profile of thermally poled fused silica was found to correlate with a buried Gaussian function. The nonlinear depth, calculated by curve fitting Maker fringes assuming a step-like nonlinear profile, corresponded to the location of the 1/e peak in the buried Gaussian function. The etching rate in hydrofluoric acid of the UV-bleached thermally poled fused silica was found to be the same as that of unpoled fused silica along the direction of the poling field but was larger along the direction perpendicular to the poling field.

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