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In this work, Pb(Zr,Ti)O3 thin films were used to fabricate well-ordered nanodot arrays by means of nanosphere lithography. This technique is based on a two-step etch process that enables excellent control of the fabrication of ordered nanodisc arrays of defined height, diameter, and pitch. Piezoresponse force microscopy was used to investigate both non-patterned and patterned films. The topography and both the out-of-plane and the in-plane polarization were deduced in this mode. Grains of nanodots with a low aspect ratio form domain structures comparable to domains in non-patterned two-dimensional films. In contrast, nanodots with a higher aspect ratio form particular structures like bi-sectioned domain assemblies, c-shaped domains or multi-domains surrounding a center domain. The patterning of the ferroelectric material was shown to affect the formation of ferroelectric domains. The initial polycrystalline films with random polarization orientation re-orient upon patterning and then show domain structures dependent on the nanodisc diameter and aspect ratio.

With Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed.
In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters.
Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure.
Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact.
We will explain the individual features and design considerations of our DLW test artifact. 
The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresist, laser power and scanning speed and to analyse the geometric accuracy of a structure produced using these guidelines.

With Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed. In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our DLW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresist, laser power and scanning speed and to analyse the geometric accuracy of a structure produced using these guidelines.