No abstract

This paper provides information on ion beam dose delivery and machining a perfect pattern in an ideal world and summarizes the various beam control limitations of the current generation systems. It discusses conventional and proposed solutions to these limitations and highlights their effect on minimum dimension nanomachining applications at the 14 nm Si process node and beyond. The paper highlights the solutions that can be implemented to help negate inconsequential effects of systems. With that in mind, the most significant of these factors in limiting a tool's ability to complete a perfect pattern can be grouped into two categories: timing and placement and non-uniform dose delivery. With good understanding and discipline, most of these issues described can be corrected, significantly minimized, or simply avoided.

No abstract

No abstract

With the development of ultra-fast laser technology, several new imaging techniques have pushed optical resolution past the diffraction limit for traditional lightbased optics. Advancements in lithography have enabled the straightforward creation of micron-and nanometer-sized optical devices. Exposing metal-dielectric structures to light can result in surface plasmon excitation and propagation along the transition interface, creating a surface plasmon polariton (SPP) response. Varying the materials or geometry Portland State University and the chair of my Master's Thesis Committee.