Transparent conductive grids are patterned by direct writing of concentrated silver nanoparticle inks. This maskless, etch-free patterning approach is used to produce well-defined, two-dimensional periodic arrays composed of conductive features with center-to-center separation distances of up to 400 µm and an optical transmittance as high as 94.1%.

OrmoClear waveguides are patterned by direct‐write assembly of a photocurable liquid core encapsulated by a fugitive viscoelastic shell. Straight, curved, and out‐of‐plane waveguides can be patterned by this approach. Optical waveguide networks coupled to multiple LEDs are demonstrated.

Printed Sn-doped In(2)O(3) (ITO) microelectrodes are fabricated by direct-write assembly of sol-gel inks with varying concentration. This maskless, non-lithographic approach provides a facile route to patterning transparent conductive features in planar arrays and spanning architectures.

High filling fraction gallium phosphide (GaP) inverse opals were fabricated by atomic layer deposition within the void spaces of silica colloidal crystal templates. Depositions were performed from 400to500°C using trimethylgallium and tris(dimethylamino)phosphine precursors. The resulting films were characterized by optical reflectance, which indicated infiltration as high as 100% of the conformal film growth maximum, corresponding to a volume filling fraction of 0.224. X-ray diffraction measurements confirmed the crystallinity of the film. These results indicate the fabrication of three-dimensional photonic crystals using a III-V optoelectronic material with sufficient dielectric contrast to form a full photonic band gap in the visible.

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