Electron beam lithography for magnetic recording heads: Characterization and optimization of critical components J. kV resist technology for microcolumn-based electron-beam lithographyA multielectron beam tool from MAPPER lithography was installed in LETI premises in July 2009. It is based on low voltage lithography. In order to prepare acceptance tests, a preliminary study was carried out with a Leica VB6 HR at 5 kV in order to define 5 kV suitable resist processes. Results obtained at higher voltages are compared, since this tool has the capability to accelerate electrons up to 50 kV. The dependence of the deposition of backscattered energy on voltage is also evaluated. The 5 kV results are compared with those obtained on the MAPPER tool. Its spot size is measured, while a 32 nm half pitch resolution is reached.

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