Axial structure of a plasma column produced by a largeamplitude electromagnetic surface waveThe axial electron number density distribution of a plasma produced by a rf surface wave launcher has been found theoretically. The results obtained are expressed in the form of universal curves which are applicable to a wide range of experimental conditions (wave frequency, collision frequency, tube radius). The theory agrees well with the available experimental data.

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An analytical semiquantitative theoretical model founded on the self-bias voltage dependence on the absorbed radio-frequency (rf) power of a strongly asymmetric capacitively coupled rf discharge has been developed. The model is applicable under gas-discharge conditions typical of technological etching devices and suggests an experimental method for determining basic plasma parameters, more specifically the ion flux onto the powered electrode, without using any additional probes.

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