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Indium tin oxide (ITO) thin films on soda-lime-silicate (SLS) and silica glasses were fabricated using an RF plasma mist deposition process. SEM analysis showed that the ITO films consisted of uniform particle size with a size ranging from 50 to 200 nm. XRD revealed that 1n203 phase is present in the film when In : Sn ratio is 5 : 5 and higher. The resistivity of the ITO films was between 1-10 ohm-cm. The structural change near the surface of the glass was investigated by DRIFT (Diffuse reflectance infrared Fourier transform) spectroscopy. The infrared results indicated that the structure near the surface was significantly changed with higher indium concentration. The coating materials create non-bridging oxygen near the surfaces. The effects of deposition time and substrate temperature were also studied.

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We report new results on continuous wave Nd: YAG laser deposition of Cadmium Sulfide (CdS) thin films. Substrates were soda-lime silicate (SLS) glass, silica glass, silicon, alumina, and copper coated formvar sheets. As-deposited films were characteristically mixtures of cubic and hexagonal phases. X-ray diffraction analysis reveals that two different grain size groups are present. As revealed by SEM micrographs, films had smooth surface morphology. Transmission electron microscopy analysis reveals that grain sizes were extremely small. Also, semiconductive behavior was noted.