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Long range mass transport driven by an electric field has many applications in the fields of nanoscience and technology. Liquid-phase mass transport ranging from the micrometer to the millimeter scale and its application to nanopatterning have been demonstrated on chromium (Cr) thin films using a DC electric field. Under the influence of an electric field, the metal seems to undergo a chemical reaction, and the resulting liquid material flows out radially in all directions. In this study, we have explored the effect of an alternating (AC) electric field on this kind of liquid-phase material transport. Within the scope of this work, mass transport has been studied on Cr films 30 nm thick using an alternating square waveform with frequencies ranging from 100 Hz to 1000 Hz in steps of 50 Hz. The dependence of the material’s formation, flow distance, and flow velocity on frequency, for a constant applied root mean square (RMS) voltage, was studied in detail. An analytical model is presented to explain the experimental results. This study, in particular the frequency parameter and the intermittent nature of the applied bias, will help us get a better control over the mass flow process, will lead to better resolutions for the electrolithography process.

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High-resolution patterning with remarkable customizability has stimulated the invention of numerous scanning probe lithography (SPL) techniques. However, frequent tip damage, substrate-film deterioration, low throughput, and debris amassing in the patterned region are the inherent impediments that have precluded obtaining patterns with high repeatability using SPL. Hence, SPL still has not got wider acceptance for industrial fabrication and technological applications. Here, we introduce a novel SPL technique, named water electrolithography (W-ELG), for patterning at the microscale and potentially at the nanoscale also. The technique operates in the non-contact mode and is based on the selective etching, via an electrochemical process, of a metallic film (e.g., Cr) submerged into water. Here, the working of W-ELG is demonstrated by scribing a pattern into the Cr film by a traversing cathode tip along a preset locus. A numerical analysis establishing the working principles and optimization strategies of W-ELG is also presented. The tip-sample distance and tip-diameter are identified as the critical parameters controlling the pattern creation. W-ELG achieved a throughput of 1.5 × 107 μm2/h, which is the highest among the existing SPL techniques, while drawing 4 μm wide lines, and is also immune to deleterious issues of tip damage, debris amassment, etc. Therefore, the resolution of these inherent impediments of SPL in W-ELG sets the stage for a paradigm shift that may now translate the SPL from academic exploration to industrial fabrications.