A multilevel microfabrication process has been developed to produce silicon Fresnel lenses for terahertz waves. A repeated binary fabrication process was used to create lenses with up to eight levels in complexity and these lenses have been compared to both less complex structures and refractive optic lenses. The microfabrication required deep reactive ion etching and multilevel resist processing using SU8 photoresist. At the design frequency of 1 THz an eight-level lens showed significant improvement in intensity at the focus and had much reduced energy lost into sidelobes compared with refractive lenses.

Multilevel phase-shift Fresnel diffractive zone plates fabricated on silicon wafers have been used as T-ray imaging lenses. The imaging results, including spatial and temporal distribution of T-rays measured at the focal planes in the frequency range from 0.5 to 1.5 THz, indicate that the performance of the diffractive terahertz (THz) lens is comparable with or better than that of conventional refractive THz lenses. The unique properties of the T-ray binary lens make it possible to fabricate excellent optics for narrow-band THz applications.

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Terahertz diffractive optic elements have been fabricated in polypropylene by imprinting with a silicon master. A silicon master is created with eight phase levels for high diffraction efficiency and etched using inductively coupled plasma reactive ion etching. This technique enables the rapid replication of complex optical structures in a high transmission material. Excellent replication of multilevel high efficiency Fresnel lenses is shown. The resulting lenses were tested with a 2 THz quantum cascade laser. The signal strength at the focus was 70 times the base signal strength.

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